Introduction to the Wide Application of Hydrogen Generator in MOCVD
Release time:
Jun 16,2022
MOCVD is a new type of vapor-phase epitaxial growth technology that evolved from vapor-phase epitaxy (VPE). It utilizes organic compounds of Group III and II elements, as well as hydrides of Group V and VI elements, as crystal growth source materials. Through thermal synthesis reactions, it performs vapor-phase epitaxy on the substrate to grow thin single crystal materials of various Group III-V and II-VI compound semiconductors and their multiple solid solutions. The widespread application of hydrogen generators in MOCVD:
In MOCVD, hydrogen can serve as a carrier gas, transporting III (II) metal organics, V (VI) group hydrides, and doping sources to the reaction chamber, providing the basis for chemical deposition reactions and thin film growth. MOCVD requires hydrogen purity of ≥99.999% (≥5N), with an inlet pressure of 4-7 bar. The hydrogen produced by the hydrogen generator can meet the gas demand in this field. Additionally, the stable hydrogen purity reduces the impact of purity fluctuations on the equipment.
Moreover, the equipment is easy to operate, ensuring continuous hydrogen supply without interruption. Users do not need to worry about running out of hydrogen or having to handle high-pressure gas cylinders. The generator runs automatically, without requiring additional manual operations. It automatically detects its own working status and errors, and once an abnormality is detected, the generator will alarm. Below is information related to MOCVD hydrogen generators.
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